Jump to content
To achieve acceptable performance and yield goals at the 65-nm technology node and below, a true DFM-aware environment is required. This environment must account for process variability and lithographic effects in the context of timing, power, noise and yield at every stage of the flow. This begins with the characterization of the cell library; it continues through implementation, analysis and optimization, and sign-off verification; and it ends with failure analysis in the fab.
Magma is leading the industry with a comprehensive characterization-to-silicon DFM-aware flow. Key components of this flow include: